发明名称 |
Method for manufacturing functional thin film. |
摘要 |
<p>A method for manufacturing a functional thin film by a vacuum evaporation method is referred to.During evaporation-depositing a thin film containing a material (6) on a substrate (1), a gas flow (from nozzle 8) controls the orientation of the material (6) in a manner that the gas flow substantially intersects the direction of the flow of vapor of said material (6) onto said substrate (6). <IMAGE></p> |
申请公布号 |
EP0454009(A1) |
申请公布日期 |
1991.10.30 |
申请号 |
EP19910106408 |
申请日期 |
1991.04.22 |
申请人 |
MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. |
发明人 |
MAEZAWA, YOSHIHARU;NOUCHI, NORIMOTO |
分类号 |
C23C14/00;C23C14/24;C23C14/56;G11B5/85 |
主分类号 |
C23C14/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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