发明名称 Method for manufacturing functional thin film.
摘要 <p>A method for manufacturing a functional thin film by a vacuum evaporation method is referred to.During evaporation-depositing a thin film containing a material (6) on a substrate (1), a gas flow (from nozzle 8) controls the orientation of the material (6) in a manner that the gas flow substantially intersects the direction of the flow of vapor of said material (6) onto said substrate (6). &lt;IMAGE&gt;</p>
申请公布号 EP0454009(A1) 申请公布日期 1991.10.30
申请号 EP19910106408 申请日期 1991.04.22
申请人 MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. 发明人 MAEZAWA, YOSHIHARU;NOUCHI, NORIMOTO
分类号 C23C14/00;C23C14/24;C23C14/56;G11B5/85 主分类号 C23C14/00
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