| 摘要 |
PURPOSE:To prevent the degradation in sectional shape at the time of overetching by incorporating a chromium carbide, chromium nitride and chromium oxide into an antireflection film and decreasing the degree of oxidation of the antireflection film from a light transparent substrate toward a light shieldable thin film in the thickness direction thereof. CONSTITUTION:The 1st antireflection film 2 consists of the chromium carbonitrooxides and the degree of the oxidation thereof decreases from the light transparent substrate 1 toward the light shieldable thin film 3 in the thickness direction thereof. The degree of the oxidation of the antireflection film 2 is changed in the film thickness direction, by which the side etching rate is suppressed and the prescribed sectional shape is obtd. The etching rate of the antireflection film 2 is matched with the etching rate of the light shieldable thin film 3 laminated thereon by carbonizing the chromium. The formation of the film to the overhang-like sectional shape is prevented in this way. |
