| 摘要 |
PCT No. PCT/DE91/00602 Sec. 371 Date Mar. 31, 1992 Sec. 102(e) Date Mar. 31, 1992 PCT Filed Jul. 25, 1991 PCT Pub. No. WO92/02858 PCT Pub. Date Feb. 20, 1992.A method of producing microstructures having regions of different structural height includes providing a layer of positive resist material that is sensitive to X-ray radiation with microstructures on a side facing a source of X-rays. Using a mask, the layer of a positive resist material is partially irradiated with the X-rays. The irradiated regions are removed with the aid of a developer. |
| 申请人 |
KERNFORSCHUNGSZENTRUM KARLSRUHE GMBH, 7500 KARLSRUHE, DE;BUERKERT GMBH, 7118 INGELFINGEN, DE |
发明人 |
KOWANZ, BERND, 7515 LINKENHEIM, DE;BACHER, WALTER, DR., 7513 STUTENSEE, DE;BLEY, PETER, DR., 7514 EGGENSTEIN-LEOPOLDSHAFEN, DE;HARMENING, MICHAEL, DR., 7513 STUTENSEE, DE;MOHR, JUERGEN, DR., 7511 SULZFELD, DE |
