发明名称 |
MICROWAVE PLASMA GENERATING APPARATUS AND PROCESS FOR PREPARING DIAMOND LAYER BY UTILIZING SAME |
摘要 |
The present invention relates to a microwave plasma generating apparatus for generating plasma by radiating microwave pulses into a discharging space so adapted as to generate plasma of a large region in a given position, which is characterized by a plurality of microwave radiation means for continuously radiating microwave pulses by staggering the timing of radiation of the microwave pulses, and to a process for the preparation of a diamond layer, which is characterized by synthesizing. the diamond layer by taking advantage of the microwave plasma generating apparatus in order to efficiently form the diamond layer with a uniform film thickness on the substrate member of a wide area. The present invention provides a useful microwave plasma generating apparatus and method for the preparation of the diamond layer. 3 9
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申请公布号 |
CA2069942(A1) |
申请公布日期 |
1992.04.02 |
申请号 |
CA19912069942 |
申请日期 |
1991.10.01 |
申请人 |
IDEMITSU PETROCHEMICAL COMPANY LIMITED |
发明人 |
ITATANI, RYOHEI;ISOZAKI, TOSHIO;HAYASHI, NARIYUKI |
分类号 |
C01B31/06;B01J12/00;B01J19/08;B01J19/12;C23C16/27;C23C16/511;C30B25/10;C30B29/04;H01J37/32;H05H1/46;(IPC1-7):C23C16/50 |
主分类号 |
C01B31/06 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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