| 摘要 |
<p>PURPOSE:To make it possible to obtain a uniform reaction over the whole range of a substrate by a method wherein the substrate is inserted into a recess in a spacer where the recess is used as a supporting area for a substrate, and the spacer where the substrate is placed is mounted on the recess in a suscepter. CONSTITUTION:A substrate 4 is placed on a recess 2 on a spacer where the depression 2 is used as a supporting area for a substrate, the spacer 1 where the substrate 4 is placed is mounted on the recess in the suscepter 6. Moreover, it is desirable that the material for the spacer 1 is graphite, pyrolytic boron nitrate, molybdenum or quartz. Thus, it is made possible to mount the substrate 4 on the suscepter 6 to obtain a uniform reaction over the whole range of the substrate 4 without touching the surface of the substrate or even touched, only with a small area touched.</p> |
