| 摘要 |
PURPOSE:To enhance a light-resistance property by a method wherein a photosensitive material whose optical property is changed with reference to light in a second wavelength band when it is irradiated with light in a first wavelength band, to which a write and erasure operation can be executed and which is composed of a spirooxadine-based photochromic material is formed on a substrate face. CONSTITUTION:A photosensitive material whose optical property is changed with reference to light in a second wavelength band when it is irradiated with light in a first wavelength band, to which a write and erasure operation can be executed and which is composed of a spirooxadine-based photochromic material is formed on the substrate face of a dummy wafer used for an aligner by means of which a pattern on a first object is exposed and transcribed onto a second object face by using the light in the first wavelength band. A material in which a spirooxadine-based photochromic compound has been monodispersed simply into a polymer or a material which contains a spirooxadine-based photochromic compound in a polymer by a covalent bond can be used for the spirooxadine-based photochromic material. Thereby, it is possible to obtain an excellent light-resistant property. |
