| 摘要 |
PURPOSE:To make it possible to automate the constituting work with respect to the calibrating method for an image sensing apparatus. CONSTITUTION:In a position-deviation measuring device for a semiconductor-chip forming substrate provided with an image sensing apparatus 7 for image processing of an input image signal, a calibrating mark 3 for the image sensing apparatus 7 is provided on a stage 2 on which the semiconductor-chip forming substrate 9 is mounted or on the semiconductor-chip forming substrate 9. The amount of deviation between a pair of mark patterns 3a and 3b in two-axis directions of the X-Y coordinates with respect to the calibrating mark 3 is measured with a measuring means which is more accurate than the image sensing apparatus 7. An image processing device 6 of the image sensing apparatus 7 is adjusted so that the amount of the deviation between the mark patterns 3a and 3b obtained with the measuring means agrees with the amount of the deviation between the mark patterns 3a and 3b detected with the image sensing apparatus 7. |
