WAFER SUPPORTER FOR PHOTOCHEMICAL DEPOSITION AND RAPID THERMAL PROCESS APPARATUS

摘要

The frame is used for supporting wafer in a reactor of photo CVD or rapid heat-treating process for manufacturing LSI semiconductor. The frame comprises quartz-plate wafer supporter (2) having positioning pin (1a) engaged with positioning hole (2a) at reactor body (1) and other positioning pin (1b) engaged with slot (3a) of latch piece (3); lead wire (4) inserted to lead-wire holes at the side of the supporter (2); three L-shaped support pins (5) arranged with same intervals at the periphery of central circular space (2c).