| 摘要 |
PURPOSE:To improve the adhesive power of color filter films and a substrate and to suppress the peeling of the films so as to improve reliability by subjecting the residual films of the color filters generated on the substrate surface exclusive of the color filter regions to a partial polishing treatment. CONSTITUTION:The residual films 2 of the color filters generated on the surface of the substrate exclusive of the color filter regions are subjected to the partial polishing treatment in the process for production of the color liquid crystal display element constituted by applying a photosensitive base material 1 on the substrate surface and selectively providing the color filter regions by utilizing photolithography, then forming the film having the adhesive power to the substrate 3. The residual films 2 of the photosensitive base material generated in the positions exclusive of the color filter regions are partially polished, by which the residual films 2 interposed between the substrate 3 and the film having the adhesive power to this substrate 3 are partially removed. Then, the substrate 1 and the film having the adhesive power to the substrate 1 are in direct contact with each other in the parts where the residual films 2 are removed and, therefore, the adhesive power of the film having the adhesive power to the substrate 1 and the substrate 1 is improved. |
