摘要 |
The present invention provides compositions of matter useful as deposition agents for making structures, including thin film structures and hard coatings, on substrates and features of substrates. In an embodiment, for example, the present invention provides metal complexes having one or more diboranamide or diboranaphosphide ligands that are useful as chemical vapor deposition (CVD) and/or atomic layer deposition (ALD) precusors for making thin film structures and coatings. Metal complex CVD precursors are provided that possess volitilities sufficiently high so as to provide dense, smooth and homogenous thin films and coatings. |
申请人 |
THE BOARD OF TRUSTEES OF THE UNIVERSITY OF ILLINOIS;GIROLAMI, GREGORY S.;KIM, DO YOUNG;ABELSON, JOHN R.;KUMAR, NAVNEET;YANG, YU;DALY, SCOTT |
发明人 |
GIROLAMI, GREGORY S.;KIM, DO YOUNG;ABELSON, JOHN R.;KUMAR, NAVNEET;YANG, YU;DALY, SCOTT |