| 摘要 |
PROBLEM TO BE SOLVED: To provide a method of manufacturing an electronic device having a phase-separated dielectric structure. SOLUTION: The manufacturing method includes: deposition of a semiconductor layer; liquid phase deposition of a dielectric composition including a low-permittivity material, a high-permittivity material, and liquid without phase separation of low- and high-permittivity materials; and the generation of phase separation of the low-permittivity and high-permittivity materials. The low-permittivity material has a concentration higher than that of the high-permittivity material in a region of a dielectric structure closest to the semiconductor layer. The semiconductor layer is deposited before the dielectric composition is subjected to liquid deposition, or after phase separation is generated. COPYRIGHT: (C)2009,JPO&INPIT
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