发明名称 |
RETICLE DEFECT INSPECTION APPARATUS AND INSPECTION METHOD USING THEREOF |
摘要 |
A reticle defect inspection apparatus that suppresses deterioration of optical components resulting from luminescent spots generated by an integrator and can sustain a defect inspection with high precision for a long time is provided. The reticle defect inspection apparatus is a reticle defect inspection apparatus for inspecting for defects on a reticle using a pattern image obtained by irradiating the reticle on which a pattern is formed with light. And the apparatus includes an illuminating optical system for irradiating the reticle with an inspection light and a detecting optical system for detecting a pattern image of the reticle irradiated with the inspection light, wherein the illuminating optical system comprises an integrator for equalizing illumination distribution of the inspection light and a moving mechanism for enabling the integrator to slightly move in a direction perpendicular to an optical axis of the integrator.
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申请公布号 |
US2008259328(A1) |
申请公布日期 |
2008.10.23 |
申请号 |
US20080047844 |
申请日期 |
2008.03.13 |
申请人 |
ADVANCED MASK INSPECTION TECHNOLOGY INC. |
发明人 |
HIRANO RYOICHI;OGAWA RIKI |
分类号 |
G01N21/00;G01N21/956;G03F1/84 |
主分类号 |
G01N21/00 |
代理机构 |
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