发明名称 |
Lithographic apparatus and device manufacturing method |
摘要 |
A lithographic apparatus includes a polarization changing element including at least two wedge-shaped optically active members configured to rotate the polarization direction of at least a portion of the radiation beam with a predetermined angle with respect to the first direction and an optical propagation length adaptor associated with the wedge-shaped optically active members to adjust the predetermined angle.
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申请公布号 |
US2008259300(A1) |
申请公布日期 |
2008.10.23 |
申请号 |
US20070785906 |
申请日期 |
2007.04.20 |
申请人 |
ASML NETHERLANDS B.V. |
发明人 |
KLAASSEN MICHEL FRANSOIS HUBERT;VAN GREEVENBROEK HENDRIKUS ROBERTUS MARIE;MULDER HEINE MELLE;GREIJDANUS ERIK MARTIJN |
分类号 |
G03B27/42 |
主分类号 |
G03B27/42 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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