发明名称 |
VERFAHREN ZUR HERSTELLUNG EINER STRUKTURIERTEN DÜNNSCHICHTVORRICHTUNG |
摘要 |
A method for manufacturing a flat panel display device includes a step of selectively forming, on a bank formation surface having an inorganic material portion, banks containing at least an organic material, and filling areas enclosed by the banks with a liquid thin film material for display to form a thin film layer, whereby the method further comprises: a first step of performing an oxygen gas plasma treatment for the banks and the bank formation surface; a second step of performing fluorine-based gas plasma treatment subsequent to the first process; and a thin film formation step of filling the areas enclosed by the banks with the liquid thin film material to form the thin film layer. |
申请公布号 |
DE69939514(D1) |
申请公布日期 |
2008.10.23 |
申请号 |
DE1999639514 |
申请日期 |
1999.03.17 |
申请人 |
SEIKO EPSON CORP. |
发明人 |
SEKI, SYUNICHI;KIGUCHI, HIROSHI;YUDASAKA, ICHIO;MIYAJIMA, HIROO |
分类号 |
G02B5/20;H05B1/00;G09F9/00;G09F9/30;G09F9/33;H01L27/00;H01L27/32;H01L33/26;H01L33/42;H01L33/48;H01L51/00;H01L51/40;H01L51/50;H01L51/52;H01L51/56;H05B33/10;H05B33/12;H05B33/14;H05B33/22 |
主分类号 |
G02B5/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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