发明名称 VERFAHREN ZUR HERSTELLUNG EINER STRUKTURIERTEN DÜNNSCHICHTVORRICHTUNG
摘要 A method for manufacturing a flat panel display device includes a step of selectively forming, on a bank formation surface having an inorganic material portion, banks containing at least an organic material, and filling areas enclosed by the banks with a liquid thin film material for display to form a thin film layer, whereby the method further comprises: a first step of performing an oxygen gas plasma treatment for the banks and the bank formation surface; a second step of performing fluorine-based gas plasma treatment subsequent to the first process; and a thin film formation step of filling the areas enclosed by the banks with the liquid thin film material to form the thin film layer.
申请公布号 DE69939514(D1) 申请公布日期 2008.10.23
申请号 DE1999639514 申请日期 1999.03.17
申请人 SEIKO EPSON CORP. 发明人 SEKI, SYUNICHI;KIGUCHI, HIROSHI;YUDASAKA, ICHIO;MIYAJIMA, HIROO
分类号 G02B5/20;H05B1/00;G09F9/00;G09F9/30;G09F9/33;H01L27/00;H01L27/32;H01L33/26;H01L33/42;H01L33/48;H01L51/00;H01L51/40;H01L51/50;H01L51/52;H01L51/56;H05B33/10;H05B33/12;H05B33/14;H05B33/22 主分类号 G02B5/20
代理机构 代理人
主权项
地址