| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a manufacturing method of a photoelectric cell capable of rapidly adsorbing a photo-sensitizing material without being easily adsorbed by a conventional method or low in adsorption speed, and high in photoelectric conversion efficiency. <P>SOLUTION: This manufacturing method of a photoelectric cell is characterized in that, after forming a porous metal oxide semiconductor film with a photo-sensitizing material adsorbed thereto on a surface of an electrode layer 1 of a base material with the electrode layer 1 formed on the surface, the base material and a substrate 2 having an electrode layer 2 on a surface thereof are arranged to face the electrode layer 1 and the electrode layer 2 to each other; and an electrolyte layer is formed between the porous metal oxide semiconductor film 1 and the electrode layer 2. In the manufacturing method of a photoelectric cell, the substrate 1 with the porous metal oxide semiconductor film 1 formed thereon is immersed in a photo-sensitizing material solution, and the photo-sensitizing material is adsorbed by applying a D.C. voltage to the electrode layer 1 and the photo-sensitizing material solution. The porous metal oxide semiconductor film 1 is formed by applying the D.C. voltage to the electrode layer 1 and a metal oxide particle dispersion liquid. <P>COPYRIGHT: (C)2009,JPO&INPIT |
