发明名称 BASE ISOLATION STRUCTURE, AND METHOD OF MANUFACTURING FOR BASE ISOLATION STRUCTURE
摘要 PROBLEM TO BE SOLVED: To provide a base isolation structure and a method of manufacturing for the base isolation structure adapted to a comparatively small lightweight object with a light load. SOLUTION: The base isolation structure 10 is formed as follows. One thin plate 1 is laid on the bottom of a die 20, and a layer is so formed that a plurality of hard particles 2 is isolatedly placed at intervals on the thin plate 1. When forming a single-layer base isolation structure, the thin plate 1 is placed on the layer. When forming a multilayered base isolation structure, a plurality of layers formed by placing the hard particles 2 on the thin plate 1 are similarly layered on the layer. After the thin plate 1 is placed on the uppermost layer, an uncured liquid elastic body material 3a is filled into the die 20, and then the elastic body material 3 is cured. COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2008256053(A) 申请公布日期 2008.10.23
申请号 JP20070097804 申请日期 2007.04.03
申请人 POLSYS KENKYUSHO:KK 发明人 MORI TOSHIMI
分类号 F16F15/04;E04H9/02 主分类号 F16F15/04
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