发明名称 |
METHOD FOR MANUFACTURING SILICON MONOXIDE VAPOR DEPOSITION MATERIAL AND ITS MANUFACTURING METHOD |
摘要 |
PROBLEM TO BE SOLVED: To provide a method for manufacturing a silicon monoxide vapor deposition material having high productivity by uniformly depositing a silicon monoxide solid without unevenness. SOLUTION: The method for manufacturing the silicon monoxide vapor deposition material includes: a step of preparing a mixture composed of silicon dioxide particles and molten metal silicon; a step of generating the vapor of the silicon monoxide by bringing the silicon dioxide particles in the mixture and the molten metal silicon into reaction; and a step of depositing the silicon monoxide solid from the vapor of the silicon monoxide to a deposition plate. The silicon monoxide vapor deposition material is manufactured by a method including a step of (A) measuring a deposition thickness on the deposition plate while continuously depositing the silicon monoxide on the deposition plate provided in an upper part of the mixture, and (B) a step of depositing the silicon monoxide at a deposition rate of 0.1 to 5 kg/m<SP>2</SP>hr until the deposition thickness on the deposition plate attains 5 mm. COPYRIGHT: (C)2009,JPO&INPIT
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申请公布号 |
JP2008255465(A) |
申请公布日期 |
2008.10.23 |
申请号 |
JP20070257975 |
申请日期 |
2007.10.01 |
申请人 |
NIPPON STEEL MATERIALS CO LTD |
发明人 |
TOKUMARU SHINJI;KISHIDA YUTAKA;ITO WATARU |
分类号 |
C23C14/24;C01B33/113 |
主分类号 |
C23C14/24 |
代理机构 |
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