APPARATUS FOR CLEANING SUBSTRATE

摘要

A substrate cleaning apparatus is provided to remove fully photoresist residues from a periphery of a chucking pin by minimizing a contact area between a substrate and a substrate chucking unit. A chamber(100) includes a space in which a cleaning process is performed. A substrate supporting unit(200) is positioned in the chamber in order to support a substrate. A substrate chucking unit(300) is movably installed at an elevation groove formed in an upper surface of the substrate supporting unit. The substrate chucking unit includes a chucking pin having a finger member formed at an upper surface of a plate-shaped body in order to grip an outer circumference of the substrate. The substrate chucking unit further includes an elastic member formed at the elevation groove in order to support elastically the chucking pin. A nozzle unit is installed at the chamber in order to inject a fluid for cleaning the substrate.