发明名称 PIEZOELECTRIC ELEMENT MANUFACTURING METHOD AND LIQUID EJECTION HEAD MANUFACTURING METHOD
摘要 <P>PROBLEM TO BE SOLVED: To provide a piezoelectric element manufacturing method for producing a desirable piezoelectric element by the epitaxial growth method such as the sputtering method or the oriented growth method, and to provide a liquid ejection head manufacturing method. <P>SOLUTION: A lower electrode 14 is formed in a film on a top face 12 of a substrate 10, a piezoelectric film 16 is formed on the lower electrode 14 by the sputtering method, and an upper electrode 18 is formed in a film on the top face of the piezoelectric film 16. Thereafter, a wiring layer is formed to join a flexible cable 34. In this state, after an AC electric field of not smaller than a coercive electric field is impressed, a positive voltage is applied to the upper electrode 18 making the lower electrode 14 the ground, and an electric field is applied to the piezoelectric film. Hence a polarization direction of the piezoelectric film 16 which is a direction from the lower electrode 14 to the upper electrode 18 can be reversed, and the piezoelectric element 20 can be deformed in an ejection direction by applying a positive voltage to the upper electrode 18 making the lower electrode 14 the ground. Processing of polarization reversing of the piezoelectric film can be carried out even when what cannot stand application of a high temperature and a high pressure is present. <P>COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2008254206(A) 申请公布日期 2008.10.23
申请号 JP20070095521 申请日期 2007.03.30
申请人 FUJIFILM CORP 发明人 TSUKAMOTO TATSUJI
分类号 B41J2/16;B41J2/045;B41J2/055;B41J2/135;B41J2/14;H01L41/083;H01L41/09;H01L41/18;H01L41/22;H01L41/257;H01L41/29;H01L41/316;H01L41/318;H01L41/39 主分类号 B41J2/16
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