| 摘要 |
PROBLEM TO BE SOLVED: To prevent a substrate from being contaminated by a spontaneous oxide film during the transfer period with an apparatus. SOLUTION: A substrate mounting shelf installed in a load lock chamber has a first carry-in and carry-out port through which a substrate is carried in and carried out by a first transport robot holding the substrate, and a second carry-in and carry-out port through which a substrate is carried in and carried out by a second transport robot, and is structured of a plurality of props having grooves into which the peripheral of the substrate is inserted. The access directions to the substrate mounting shelf by the first and second transport robots are set in different directions. The first and second taking-in and out ports of the substrate mounting shelf, respectively, are set between adjacent two props out of the plurality of props, and the positions of the first and second carry-in and carry-out ports are configured so as to absorb the difference in the access direction, by setting the depth of at least one prop grooves to be deeper than that of the other prop grooves out of the grooves of the plurality of props. COPYRIGHT: (C)2009,JPO&INPIT
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