发明名称 |
PROCESS OF MANUFACTURING PHASE-SEPARATED DIELECTRIC STRUCTURE |
摘要 |
PROBLEM TO BE SOLVED: To provide a method of manufacturing an electronic device having a phase-separated dielectric structure. SOLUTION: An electronic device includes (a) a semiconductor layer and (b) the phase-separated dielectric structure comprising low- and high-permittivity polymers in any sequence. In this case, the low-permittivity polymer has a concentration higher than that of the high-permittivity polymer in a region of the dielectric structure closest to the semiconductor layer. COPYRIGHT: (C)2009,JPO&INPIT |
申请公布号 |
JP2008258610(A) |
申请公布日期 |
2008.10.23 |
申请号 |
JP20080077942 |
申请日期 |
2008.03.25 |
申请人 |
XEROX CORP |
发明人 |
WU YILIANG;MAHABADI HADI K;ONG BENG S;SMITH PAUL F |
分类号 |
H01L29/786;H01L21/312;H01L21/336;H01L51/05;H01L51/30 |
主分类号 |
H01L29/786 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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