发明名称 PROCESS OF MANUFACTURING PHASE-SEPARATED DIELECTRIC STRUCTURE
摘要 PROBLEM TO BE SOLVED: To provide a method of manufacturing an electronic device having a phase-separated dielectric structure. SOLUTION: An electronic device includes (a) a semiconductor layer and (b) the phase-separated dielectric structure comprising low- and high-permittivity polymers in any sequence. In this case, the low-permittivity polymer has a concentration higher than that of the high-permittivity polymer in a region of the dielectric structure closest to the semiconductor layer. COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2008258610(A) 申请公布日期 2008.10.23
申请号 JP20080077942 申请日期 2008.03.25
申请人 XEROX CORP 发明人 WU YILIANG;MAHABADI HADI K;ONG BENG S;SMITH PAUL F
分类号 H01L29/786;H01L21/312;H01L21/336;H01L51/05;H01L51/30 主分类号 H01L29/786
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