| 摘要 |
A method of manufacturing a mother stamper comprises: a first resist layer formation process for forming a first resist layer on a substrate; a first electron beam irradiation process for irradiating electron beam at a first pattern on the first resist layer; a first development process for developing the first resist layer to remove the non-exposed area; a second resist layer formation process for forming a second resist layer on the substrate onto which the first resist layer remains; a second electron beam irradiation process for irradiating electron beam at a second pattern on the second resist layer; a second development process for developing the second resist layer to remove the exposed area that has been exposed in the second electron beam irradiation process; and an etching process for etching the substrate to provide a grooved pattern with different depths.
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