| 摘要 |
An exposure apparatus comprises an optical system support supporting a projection optical system, a stage surface plate, first stage and second stages, a first interferometer configured to measure stage position in a first area, a second interferometer configured to measure stage position in a second area, a third interferometer which is interposed between the first interferometer and the second interferometer, a gap sensor configured to measure a gap between the optical system support and the stage surface plate, and a control unit configured to pass, in the swapping, the measurement result obtained by one of the first interferometer and the second interferometer to the other one of the first interferometer and the second interferometer using the measurement result obtained by the third interferometer, and to correct the passed measurement result based on the measurement result obtained by the gap sensor.
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