| 摘要 |
PROBLEM TO BE SOLVED: To provide a substrate treatment method capable of improving processing efficiency by generating a remarkable change on a substrate surface in substrate treatment by a treatment fluid, and a substrate treatment apparatus. SOLUTION: To the mixing part 40 of a mixing valve 4, chemical undiluted solutions from chemical supply sources 71-74 and normal temperature pure water and warm pure water from a pure water supply source can be supplied. A treatment liquid is supplied from the mixing valve 40 through a treatment liquid supply path 3 to a treatment liquid nozzle 2, and the treatment liquid is supplied to a substrate W. During the treatment of the substrate W by the treatment liquid, a fluctuation is imparted to a process parameter by the control of liquid introduction valves 41-44, flow rate adjustment valves 101-104, a pure water supply source valve 51, a warm pure water supply source valve 52 and a pure water valve 5, etc. COPYRIGHT: (C)2009,JPO&INPIT
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