| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a substrate for a photomask blank and a photomask blank in which film thickness uniformity in the plane of a resist film can be improved and high mask pattern accuracy is obtained, and to provide a photomask having a fine pattern with high pattern accuracy formed by using the photomask blank. <P>SOLUTION: The substrate 1 for a photomask blank has a thin film for forming a transfer pattern on a light transmitting substrate, wherein the substrate 1 has main surfaces 11a, 11b and an end face 12 formed on the rim of the main surfaces, and the end face 12 includes a side face 12c of the substrate and chamfered faces 12a, 12b interposed between the side face and the main surfaces. The side face 12c has a flatness of≤50μm. The photomask blank has a thin film for forming a transfer pattern, the film formed on the main surface of the substrate 1. The photomask has a transfer pattern formed by patterning the thin film from the photomask blank. <P>COPYRIGHT: (C)2009,JPO&INPIT</p> |
