发明名称 |
METHOD FOR MANUFACTURING ORGANIC SEMICONDUCTOR ELEMENT |
摘要 |
PROBLEM TO BE SOLVED: To provide a method for manufacturing an organic semiconductor element in which an organic semiconductor layer can be formed uniformly by an ejection method only between a source electrode and a drain electrode of porous material. SOLUTION: The method for manufacturing an organic semiconductor element comprises a step for forming a source electrode and a drain electrode composed of a porous material on lines parallel with each other, and a step for forming an organic semiconductor layer between the source electrode and the drain electrode by ejecting coating liquid for forming an organic semiconductor layer containing an organic semiconductor material while moving an ejector in the direction substantially perpendicular to the lines on which the source electrode and the drain electrode are formed. COPYRIGHT: (C)2009,JPO&INPIT
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申请公布号 |
JP2008258206(A) |
申请公布日期 |
2008.10.23 |
申请号 |
JP20070095708 |
申请日期 |
2007.03.30 |
申请人 |
DAINIPPON PRINTING CO LTD |
发明人 |
HONDA HIROYUKI;KOBAYASHI HIRONORI;MATSUOKA MASANAO;NAGAE MITSUTAKA |
分类号 |
H01L21/336;H01L29/786;H01L51/05;H01L51/30;H01L51/40 |
主分类号 |
H01L21/336 |
代理机构 |
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主权项 |
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地址 |
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