发明名称 METHOD FOR MANUFACTURING ORGANIC SEMICONDUCTOR ELEMENT
摘要 PROBLEM TO BE SOLVED: To provide a method for manufacturing an organic semiconductor element in which an organic semiconductor layer can be formed uniformly by an ejection method only between a source electrode and a drain electrode of porous material. SOLUTION: The method for manufacturing an organic semiconductor element comprises a step for forming a source electrode and a drain electrode composed of a porous material on lines parallel with each other, and a step for forming an organic semiconductor layer between the source electrode and the drain electrode by ejecting coating liquid for forming an organic semiconductor layer containing an organic semiconductor material while moving an ejector in the direction substantially perpendicular to the lines on which the source electrode and the drain electrode are formed. COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2008258206(A) 申请公布日期 2008.10.23
申请号 JP20070095708 申请日期 2007.03.30
申请人 DAINIPPON PRINTING CO LTD 发明人 HONDA HIROYUKI;KOBAYASHI HIRONORI;MATSUOKA MASANAO;NAGAE MITSUTAKA
分类号 H01L21/336;H01L29/786;H01L51/05;H01L51/30;H01L51/40 主分类号 H01L21/336
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