| 摘要 |
Even when a gate valve for a vacuum apparatus used in a vapor deposition apparatus is in an open position, reliability of keeping a vapor deposition chamber vacuum can be improved by protecting an inner wall surface of a valve casing and a sealing member of a valve body against a vapor of a vapor deposition material. A gate valve (1) for a vacuum apparatus (50) is used as a gate valve for an electron gun (52). When the valve is in a closed position, as with the related art technique, a valve body (3) detaches an electron gun (52) part from a vapor deposition chamber (51). On the other hand, when the valve is in an open position, a valve chamber (15) is separated from the vapor deposition chamber (51) by inserting a cylindrical movable shield (22) into the valve chamber (15) to prevent the inner wall surface of a valve casing (2) and a sealing member (5,6,7) of the valve body (3) from being exposed to vapor in the vapor deposition chamber (51), with the result that they are protected against the deposition of a deposition material (MgO) (81). |
