| 摘要 |
<p>An exposure apparatus and a device manufacturing method are provided to prevent deterioration or variation of imaging performance by varying an aperture shape of a diaphragm according to exposition conditions. An exposure apparatus includes a light system(120), a projection optical system(106), and a diaphragm(108). The light system lights a light area of a disc(111). The projection optical system projects a pattern of the disc on a substrate(109). The diaphragm blocks flare components among flare lights from the projection optical system toward the substrate and passes the rest components of the flare lights. A shape of an aperture of the diaphragm is different from that of the light area. The aperture shape of the diaphragm is varied based on a distance from the aperture in a second direction across a first direction in parallel with a scanning direction of the substrate.</p> |
