| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a process layout minimizing the pollution of a pattern or the inside of a device due to the back flow or liquid leakage of a liquid material such as a developer and a washing liquid in the device for forming a conductive pattern, and to provide the device for forming the conductive pattern by the process layout. <P>SOLUTION: A developing/washing device in the device for forming the conductive pattern by an electrophotographic system is arranged in a region lower than the center of a photosensitive body. A solvent removing process is arranged in the region rotating the photosensitive body in the ascending direction. A transfer-liquid coating/electrostatic-transfer process is fitted in the region being upper than the center of the photosensitive body and rotating the photosensitive body in the descending direction. <P>COPYRIGHT: (C)2009,JPO&INPIT |
