发明名称 NONVOLATILE SEMICONDUCTOR STORAGE DEVICE
摘要 PROBLEM TO BE SOLVED: To provide a nonvolatile semiconductor storage device having a double well which is advantageous to microfabrication, and wells separated from the double well. SOLUTION: The nonvolatile semiconductor storage device includes a first conductive type first well 10 formed in a first conductive type semiconductor substrate 1, a plurality of memory-cell transistors Q5-1, Q5-2 formed in the first well 10, a second conductive type second well, and a second conductive type third well region 5 formed in the semiconductor substrate 1. The second well has a first portion 7 surrounding a side face region of the first well 10, and a second portion 9 surrounding a lower region of the first well 10, and electrically separates the first well 10 from the semiconductor substrate 1. COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2008258653(A) 申请公布日期 2008.10.23
申请号 JP20080157050 申请日期 2008.06.16
申请人 TOSHIBA CORP 发明人 NOGUCHI MITSUHIRO;KAJIMOTO SANETOSHI
分类号 H01L21/8247;H01L27/10;H01L27/115;H01L29/788;H01L29/792 主分类号 H01L21/8247
代理机构 代理人
主权项
地址
您可能感兴趣的专利