发明名称 Batch wafer handling system
摘要 The present invention generally provides a batch processing system having a processing chamber and a loading chamber. Substrates are transferred in and out the processing chamber in a batch by a substrate boat. A batch handling tool of the present invention is generally used in the loading chamber to load and unload the structured substrate support by group. The batch handling tool generally comprises a support member, which is configured to host at least two sets of support blades. The at least two sets of substrate supports are generally mounted on the support member and their positions are switchable when the support member rotates. Each set of the support blades is configured to load (unload) at least two substrates into(from) the substrate boat.
申请公布号 US2008257260(A9) 申请公布日期 2008.10.23
申请号 US20050242301 申请日期 2005.09.30
申请人 APPLIED MATERIALS, INC. 发明人 BRAILOVE ADAM A.;WEBB AARON
分类号 C23C16/00 主分类号 C23C16/00
代理机构 代理人
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