| 摘要 |
<p>An exposure apparatus and a device manufacturing method are provided to manufacture devices with high quality, such as semiconductor devices and LCD(Liquid Crystal Display) devices, by performing exposition with high accuracy. An exposure apparatus includes a light optical system(20) and a projection optical system(40). The light optical system lights reticles using light from a light source(10). The projection optical system projects a pattern of the reticles on a substrate. The light optical system includes a light quantity adjusting unit(201) for adjusting quantity of the lights, a polarization unit(202) for adjusting polarization of the lights, and a light splitter(208) for separating an incident light into two lights. The light quantity adjusting unit, the polarization unit, and the light splitter are sequentially disposed with respect to the light source.</p> |
