| 摘要 |
PROBLEM TO BE SOLVED: To provide an exposure method and an exposure device that can suppress uneven exposure upon carrying out division exposure with a mask pattern. SOLUTION: By using a mask as an embodiment of the present invention to carry out exposure, as the exposure light quantity decreases toward the end part of the mask (shown by dotted lines in Fig.4(b)), the exposure light transmitting the adjacent mask is superposed so as to obtain an appropriate exposure light quantity even at the end part of the exposure region. COPYRIGHT: (C)2009,JPO&INPIT |
