发明名称 EROSION RESISTANCE ENHANCED QUARTZ USED IN PLASMA ETCH CHAMBER
摘要 A method of fabricating doped quartz component is provided herein. In one embodiment, the doped quartz component is a yttrium doped quartz ring configured to support a substrate. In another embodiment, the doped quartz component is a yttrium and aluminum doped cover ring. In yet another embodiment, the doped quartz component is a yttrium, aluminum and nitrogen containing cover ring.
申请公布号 US2008261800(A1) 申请公布日期 2008.10.23
申请号 US20070738030 申请日期 2007.04.20
申请人 YUAN JIE;SUN JENNIFER Y;DUAN RENGUAN 发明人 YUAN JIE;SUN JENNIFER Y.;DUAN RENGUAN
分类号 C04B35/505 主分类号 C04B35/505
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