发明名称 |
Multilayer-film reflective mirror, exposure apparatus, device manufacturing method, and manufacturing method of multilayer-film reflective mirror |
摘要 |
Multilayer-film reflective mirrors are disclosed. An exemplary such mirror has a base and a multilayer film formed on the base. The multilayer film includes multiple layer pairs. Each layer pair includes a respective first layer and a respective second layer, wherein the first and second layers are laminated together in an alternating manner. The multilayer film has first and second regions that reflect extreme ultraviolet light. A first group of layers is disposed in the first and second regions and has a first periodic length. A second group disposed in the first region has a second periodic length different from the first periodic length, and a third group disposed in the second region has a substantially same periodic length as the first periodic length.
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申请公布号 |
US2008259439(A1) |
申请公布日期 |
2008.10.23 |
申请号 |
US20080074903 |
申请日期 |
2008.03.07 |
申请人 |
NIKON CORPORATION |
发明人 |
SHIRAISHI MASAYUKI |
分类号 |
G02B5/26;B05D5/06;G02B1/10 |
主分类号 |
G02B5/26 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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