发明名称 Multilayer-film reflective mirror, exposure apparatus, device manufacturing method, and manufacturing method of multilayer-film reflective mirror
摘要 Multilayer-film reflective mirrors are disclosed. An exemplary such mirror has a base and a multilayer film formed on the base. The multilayer film includes multiple layer pairs. Each layer pair includes a respective first layer and a respective second layer, wherein the first and second layers are laminated together in an alternating manner. The multilayer film has first and second regions that reflect extreme ultraviolet light. A first group of layers is disposed in the first and second regions and has a first periodic length. A second group disposed in the first region has a second periodic length different from the first periodic length, and a third group disposed in the second region has a substantially same periodic length as the first periodic length.
申请公布号 US2008259439(A1) 申请公布日期 2008.10.23
申请号 US20080074903 申请日期 2008.03.07
申请人 NIKON CORPORATION 发明人 SHIRAISHI MASAYUKI
分类号 G02B5/26;B05D5/06;G02B1/10 主分类号 G02B5/26
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