| 摘要 |
A pattern inspection apparatus includes a first unit configured to acquire an optical image of a target workpiece to be inspected, a second unit configured to generate a reference image to be compared, a third unit configured, by using a mathematical model in which a parallel shift amount, an expansion and contraction error coefficient, a rotation error coefficient, a gray-level offset and an image transmission loss ratio are parameters, to calculate each of the parameters by a least-squares method, a forth unit configured to generate a corrected image by shifting a position of the reference image by a displacement amount, based on the each of the parameters, and a fifth unit configured to compare the corrected image with the optical image.
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