| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a photosensitive composition improved in PEB temperature dependency and exposure latitude and a pattern-forming method using the same, with respect to the photosensitive composition for use in the production process of a semiconductor such as IC, in the production of a circuit substrate of a liquid crystal, a thermal head and the like or in other photofabrication processes and a pattern-forming method using the same. <P>SOLUTION: The photosensitive composition comprises: (A) a compound capable of generating a bis(organosulfonyl)imidic acid of a specific structure upon irradiation with actinic ray or radiation; and (B) a resin that decomposes by the action of an acid to increase its solubility in an alkali developer. The pattern-forming method using the same is also provided. <P>COPYRIGHT: (C)2009,JPO&INPIT |
