发明名称 THIN FILM STRUCTURE AND ITS MANUFACTURING METHOD
摘要 PROBLEM TO BE SOLVED: To provide a thin film structure in which an inorganic thin film layer formed on a front face is hardly peelable and the wear resistance and environmental resistance of the optical components to be manufactured can be improved. SOLUTION: The thin film structure P formed on the front face of a substrate S made of a resin is provided with an adhesion layer M formed on the front face of the substrate S and the inorganic thin film layer F formed on the front face of the substrate S. The adhesion layer M is formed by forming a metal film Mo of one or two or more kinds of the metals selected from quadrivalent metals on the front face of the substrate S, subjecting the metal film Mo to treatment by the ions or radicals of the reactive gas from the front face side of the adhesion layer M to create the imperfect reactant of the metal film Mo and in succession, subjecting the imperfect reactant to treatment by the ions and radicals of an inorganic gas. COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2008255428(A) 申请公布日期 2008.10.23
申请号 JP20070099521 申请日期 2007.04.05
申请人 SHINCRON:KK 发明人 SHIONO ICHIRO;SUGAWARA TAKUYA
分类号 C23C14/06;B32B9/00 主分类号 C23C14/06
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