| 摘要 |
<p>An exposure apparatus, a method of controlling the same, and a manufacturing method thereof are provided to enhance position determination accuracy of respective stages after exchanging two stages. An optic system supporter(5) supports a projection system. First and second stages are moved between first and second areas on a stage base(4). First and second interference systems(8,7) measure stage positions in the first and second areas. A third interference system(9) implemented between the first and second interference systems measures stage positions and passes measurement result between the first and second interference systems. Gap sensors(19,20) measure a gap between the optic system supporter and the stage base. A controller(100) passes a measurement result between the first and second interference systems using a measurement result obtained by the third interference system, and compensates for the passed result based on a measurement result obtained by the gap sensors.</p> |
