| 摘要 |
PROBLEM TO BE SOLVED: To improve the operation rate of a treatment apparatus by reducing the maintenance frequency of a sublimate removal device for removing sublimate discharged from the treatment apparatus of a substrate. SOLUTION: The sublimate removal device 200 is provided with a tightly sealed container 210. To the top plate part 210d of the container 210, an exhaust gas inflow pipe 212 and a cleaning liquid supply pipe 214 are connected. To the side face lower part 210c of the container 210, a cleaning liquid discharge pipe 216 and an exhaust gas outflow pipe 218 are connected. Inside the container 210, a spherical filter 220 is provided. The filter 220 can make exhaust gas pass through and stick the sublimate. The filter 220 to which the sublimate is stuck is rotated and cleaned with cleaning liquid stored inside the container 210. COPYRIGHT: (C)2009,JPO&INPIT
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