发明名称 SUBSTRATE STRUCTURE AND METHOD OF MANUFACTURING SAME
摘要 PROBLEM TO BE SOLVED: To not only easily and reliably form a catalyst material of a simplified structure to be in uniform and high density condition but also grow a linear structure composed of a high density carbon whose diameter is controlled. SOLUTION: A method of manufacturing substrate structure includes the steps of forming a TiN thin film 12 on a silicon substrate 11, accumulating a Co particulate 13 and Ni particulate 14 both of which are mixed on the TiN thin film 12, and sequentially growing CNT 15 and 16 from the Co particulate 13 and Ni particulate 14 by changing the growth condition. COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2008258506(A) 申请公布日期 2008.10.23
申请号 JP20070100987 申请日期 2007.04.06
申请人 FUJITSU LTD 发明人 KONDO DAIYU
分类号 H01L21/285;B01J23/75;B01J23/755;B01J35/02;C01B31/02;H01L21/28;H01L21/768;H01L23/522 主分类号 H01L21/285
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