发明名称 RESISTOR LAYOUT STRUCTURE AND MANUFACTURING METHOD THEREOF
摘要 A resistor layout structure and a manufacture method thereof are provided. The resistor layout structure includes a substrate, a plurality of metals, and a plurality of resistor lumps. The plurality of metals is disposed on the substrate. The plurality of first resistor lumps is disposed on the substrate. The metals are used as a supporting structure during the disposing process. Besides, the metals are interlaced and connected in series connected with the resistor lumps to form the resistor. Therefore, the present invention decreases the resistance variability of the resistor.
申请公布号 US2008258862(A1) 申请公布日期 2008.10.23
申请号 US20070754840 申请日期 2007.05.29
申请人 INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE 发明人 CHEN WEI-TING;CHEN CHANG-SHENG;SHYU CHIN-SUN;WEI CHANG-LIN
分类号 H01C1/012;H01C17/06 主分类号 H01C1/012
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