发明名称 THIN PERMANENT-MAGNET FILM AND PROCESS FOR PRODUCING THE SAME
摘要 <p>Refractory metal layers 2, 4, 6, 8, and 10, and rare earth alloy magnetic layers 3, 5, 7, 9, 11, and 12 are alternately deposited, so as to form a multilayer structure including four or more layers on a substrate. The refractory metal layers 2, 4, 6, 8, and 10 are formed from at least one kind of material selected from a group consisting of Ti, V, Cr, Zr, Nb, Mo, Hf, Ta, and W, and each has a thickness of not less than 5 nm nor more than 50 nm. The rare earth alloy magnetic layers 3, 5, 7, 9, 11, and 12 have tetragonal R2Fe14B (R is Nd and/or Pr) as a primary constituent phase, and each has a thickness of not less than 50 nm nor more than 500 nm. &lt;IMAGE&gt;</p>
申请公布号 EP1187148(B1) 申请公布日期 2008.10.22
申请号 EP20010906188 申请日期 2001.02.21
申请人 HITACHI METALS, LTD. 发明人 UEHARA, MINORU
分类号 C23C14/06;H01F10/12;C22C38/00;C23C14/14;G11B5/64;G11B5/66;G11B5/72;G11B5/73;G11B5/84;H01F1/057;H01F10/32;H01F41/14;H01F41/30;H02K15/03 主分类号 C23C14/06
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