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发明名称
PHOTOLITHOGRAPHIC CRITICAL DIMENSION CONTROL USING RETICLE MEASUREMENTS
摘要
申请公布号
EP1470447(B1)
申请公布日期
2008.10.08
申请号
EP20020784585
申请日期
2002.11.25
申请人
INTERNATIONAL BUSINESS MACHINES CORPORATION
发明人
RANKIN, JED, H.;SCHNEIDER, CRAIN, E.;SMYTH, JOHN, S.;WATTS, ANDREW, J.
分类号
G03C5/00;G01D18/00;G03F7/20;G06F17/50;G06F19/00;G21K5/00;H01L21/027
主分类号
G03C5/00
代理机构
代理人
主权项
地址
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