CONTROL METHOD OF INSPECTING APPARATUS FOR SEMICONDUCTOR DEVICE

摘要

A control method of a semiconductor inspecting apparatus is provided to automatically detect the variation of a probe current and to automatically adjust the probe current to a pre-set value when a change in the probe current occurs, thereby stably operating a scanning electron microscope. A control method of a semiconductor inspecting apparatus comprises the following steps of: providing an object to be inspected; irradiating an electron beam to the inspected object; measuring a first probe current based on the intensity of the electron beam reached to a surface of the inspected object; judging whether the first probe current is out of a first pre-set reference range; and resetting the amplitude of the first probe current when the first probe current is out of the first reference range. The step of resetting the amplitude of the first probe current includes the following steps: changing amplitudes of an extraction voltage and a heating current for producing the electron beam; irradiating the electron beam produced in the changed condition to the inspected object; measuring a second probe current based on the intensity of the electron beam reached to the surface of the inspected object; judging whether the second probe current is out of a second pre-set reference range; and setting the probe current when the second probe current is out of a second set reference range.