| 摘要 |
<p>A pellicle is provided to prevent flatness of a mask from being impaired even when the pellicle is attached to the mask, and to perform high-performance photolithography treatment. A pellicle used in a semiconductor photolithography has a pellicle frame, wherein the surface in which the pellicle frame is attached to a mask has a flatness of 30 micron or less, and the surface in which the pellicle frame is disposed on the pellicle membrane side has a flatness of 15 micron or less. When the pellicle produced using the pellicle frame is attached to a mask, deformation of the mask is suppressed to 0.1 micron or less.</p> |
