发明名称 METHOD FOR FORMING PATTERN USING NANO IMPRINT LITHOGRAPHY AND METHOD FOR FABRICATING MICRO TIP/NEEDLE FOR VERTICAL PROBE USING THE SAME
摘要 <p>A method for forming a pattern by using a nano imprint lithography and a method for fabricating a micro tip/needle for vertical probe using the same are provided to form various fine pattern structures having a multistage structure by performing a low-temperature process. A photocurable polymer layer is formed on a substrate(21). A stamp having a protrusive pattern corresponding to a first stage groove of a multi-stage groove is attached on the photocurable polymer layer by using the pressure. The first stage groove of the photocurable polymer layer is formed within the photocurable polymer layer by pressing the stamp. A second stage groove(22b) is formed within the first stage groove by removing a region corresponding to a second stage groove from the photocurable polymer layer by performing an exposure process and a developing process.</p>
申请公布号 KR100861420(B1) 申请公布日期 2008.10.07
申请号 KR20070065012 申请日期 2007.06.29
申请人 SUH, SOO JEONG;KIM, JANG HYUN;SEO, JONG WAN 发明人 SUH, SOO JEONG;KIM, JANG HYUN;SEO, JONG WAN
分类号 H01L21/027;G01R1/067 主分类号 H01L21/027
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