| 摘要 |
An apparatus and method for dispensing a rinse solution on a substrate in which the rinse solution is dispensed through one nozzle array substantially near a center of a substrate and is dispensed through a second nozzle array across a radial span of the substrate. Accordingly, the apparatus includes a first nozzle array including at least one nozzle and configured to dispense the rinse solution substantially near a center of the substrate, a first control valve coupled to the first nozzle array and configured to actuate a first flow rate of the rinse solution through the first nozzle array, a second nozzle array including a plurality of nozzles and configured to dispense the rinse solution across a radial span of the substrate, and a second control valve coupled to the second nozzle array and configured to actuate a second flow rate of said rinse solution through the second nozzle array.
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