发明名称 MULTICOMPONENT THIN FILM AND METHOD FOR FORMING IT
摘要 PROBLEM TO BE SOLVED: To provide a multicomponent thin film in which a unit substance layer composing a thin film is formed by a mosaic atom layer composed of a substance constituent of the thin film, and to provide a method for forming it. SOLUTION: Although a unit substance layer for composing a thin film to be formed on a substrate is formed after the substrate is loaded into a reaction chamber, the unit substance layer is formed through a first stage that is formed by a mosaic atom layer composed of two types of precursors including a substance constituent for at least composing the thin film, a second stage for purging the inside of the reaction chamber, and a third stage for chemically changing the mosaic atom layer. COPYRIGHT: (C)2008,JPO&INPIT
申请公布号 JP2008199052(A) 申请公布日期 2008.08.28
申请号 JP20080101948 申请日期 2008.04.09
申请人 SAMSUNG ELECTRONICS CO LTD 发明人 RI SHOKEN;KIM DAE SIK;MIN YO-SEP;CHO YOUNG-JIN
分类号 H01L21/20;H01L21/316;C23C16/455;H01L21/31 主分类号 H01L21/20
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