| 摘要 |
PROBLEM TO BE SOLVED: To provide a substrate-treating device capable of improving throughput. SOLUTION: The substrate-treating device 100 comprises indexer blocks 10 provided in parallel mutually and first and second treatment blocks 11, 12. In the indexer block 10, there is an indexer robot IR. In the first treatment block 11, there are a plurality of rear cleaning units SSR and a first main robot MR1. In the second treatment block 12, there are a plurality of end face cleaning units SSB, a plurality of front cleaning units SS, and a second main robot MR2. COPYRIGHT: (C)2008,JPO&INPIT |
